| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 03 | WO/2026/011385 | THROTTLE VALVE POSITION ENDPOINT CONTROL WITHIN A DEPOSITION PROCESS | CN2024/104967 | C23C 16/455 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/011763 | PVD COATING PROCESSING DEVICE AND METHOD FOR CEMENTED CARBIDE CUTTING TOOL | CN2025/076752 | C23C 14/32 | TAIZHOU PRADI COATING CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/011839 | EFFICIENT AND ENVIRONMENTALLY FRIENDLY ALUMINUM PLATING MACHINE DEVICE HAVING WASTE HEAT RECYCLING FUNCTION | CN2025/084817 | C23C 2/00 | SHANGHAI RUITU NEW MATERIALS TECHNOLOGY CO. LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/011979 | VACUUM CHAMBER AND SOLAR CELL PROCESSING DEVICE | CN2025/096207 | C23C 16/50 | SUZHOU MAXWELL TECHNOLOGIES CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012119 | SEMICONDUCTOR PROCESS CHAMBER AND SEMICONDUCTOR PROCESS APPARATUS | CN2025/103335 | C23C 14/02 | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012289 | PROCESS FOR TREATING A METAL SUBSTRATE AND TREATED METAL OBTAINED BY THE SAME | CN2025/107122 | C23C 22/53 | SPECIALTY OPERATIONS FRANCE | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012381 | COATING APPARATUS, COATING METHOD, FILM LAYER AND DEVICE | CN2025/107633 | C23C 16/44 | JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012413 | PRE-COATED STEEL PLATE, LASER TAILOR-WELDED MEMBER AND HOT-STAMPED MEMBER | CN2025/107806 | C23C 26/00 | JIANGSU EASYFORMING CARBODY TECHNOLOGY CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012525 | METHOD FOR CONTROLLING FLOW RATIO BETWEEN INNER AND OUTER CAVITIES OF MOCVD APPARATUS | CN2025/122763 | C23C 16/52 | SUZHOU CASINSTRUMENTS SEMICONDUCTOR MATERIAL CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012574 | A METHOD OF PRODUCING METAL COMPOUNDS FOR COATING APPLICATIONS | EP2024/069365 | C23C 18/12 | CERES POWER LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/012718 | METHOD AND APPARATUS FOR DEPOSITING A MATERIAL ON A SUBSTRATE BY MAGNETRON SPUTTERING | EP2025/067511 | C23C 14/16 | FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/013697 | COATED ELECTROMAGNETIC INTERFERENCE (EMI) SHIELDING MESH, METHOD OF PRODUCING THE SAME, AND APPLICATIONS THEREOF | IN2025/051009 | C23C 18/00 | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014048 | METHOD FOR PRODUCING GRAIN-ORIENTED ELECTRICAL STEEL SHEET AND METHOD FOR EVALUATING INSULATING FILM TREATMENT SOLUTION | JP2025/017640 | C23C 22/00 | JFE STEEL CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014185 | VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | JP2025/022098 | C23C 14/04 | TOPPAN HOLDINGS INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014198 | MAGNETRON SPUTTERING DEVICE | JP2025/022241 | C23C 14/34 | SHIBAURA MACHINE CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014281 | METHOD AND APPARATUS FOR FORMING METAL NITRIDE FILM CONTAINING OXYGEN | JP2025/023334 | C23C 16/455 | TOKYO ELECTRON LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014514 | OXIDE SINTERED BODY, SPUTTERING TARGET, OXIDE FILM, THIN-FILM TRANSISTOR, AND ELECTRONIC DEVICE | JP2025/024833 | C23C 14/34 | IDEMITSU KOSAN CO.,LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/014791 | POWDER COATING APPARATUS HAVING PUMPING PORT | KR2025/009302 | C23C 16/44 | ALPES INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/015056 | A METHOD FOR SURFACE TREATMENT OF A STEEL BELT | SE2025/050585 | C23C 22/62 | IPCO SWEDEN AB | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/015359 | SELECTIVE ETCHING OF SILICON NITRIDE DIELECTRICS WITH MICROWAVE OXIDATION | US2025/036315 | C23C 14/00 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/015466 | METAL DEPOSITION SYSTEM | US2025/036680 | C23C 4/131 | FLUENT METAL INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/015585 | THIN FACEPLATE DESIGN FOR USE IN A PROCESSING CHAMBER | US2025/036890 | C23C 16/455 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2026 | 03 | WO/2026/015604 | SYSTEMS AND METHODS FOR REACTOR APPARATUS CONTROL DURING SEMICONDUCTOR WAFER PROCESSES | US2025/036928 | C23C 16/02 | GLOBALWAFERS CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی |